Nanofabrication Laboratory
The Department's Nanofabrication Laboratory contains facilities for semiconductor material processing, nanofabrication, and sensor and microfluidic device development. This is the main fabrication facility for the inter-departmental Nanostructure Engineering, Science and Technology research group, as well as the MacDiarmid Institute for Advanced Materials and Nanotechnology.
The equipment in the Nanofabrication Laboratory covers most aspects of semiconductor device fabrication, from materials growth and characterisation to device packaging. The principal tools are:
- Electron Beam Lithography (Raith 150)
- Reactive Ion Etching (Oxford PlasmaLab 80Plus)
- Optical Microscopy (Olympus BX30 with digital image capture)
- Atomic Force Microscope (Digital Instruments Dimension 3100)
- Plasma Ashing
- Optical Lithography (Suss MA-6)
- Nanoimprint Lithography (EVG)
- Interference Lithography
- Thin Film Deposition (Edwards AUTO 500)
- Semiconductor Device Characterisation (HP 4155A Parameter Analyser)
- Surface Profilometer (DEKTAK 150)
- Wire Bonding
- Fluorescence Microscopy (Nikon Eclipse 80i)
- Micromilling (CNC Mini- Mill/GX)
- Cell Culture Facility (PC2 Biological Containment)
These are accessible to outside organisations on a contract or collaborative basis. For more information contact Assoc.Prof. Maan Alkaisi or Dr Martin Allen