Micro- and Nanofabrication Laboratory (Rm A105)
Cleanroom Facility for micro- and nanofabrication. Equipped for thin-film deposition, thermal processing, photolithography (yellow room) including mask fabrication, nanoimprint lithography, electron beam lithography, wet etching, dry etching (reactive ion etching) and materials characterization.
Equipment:
EVG Automated NIL System
Heidelberg uPG101 Laser Mask Writer
LEO FEG-SEM & Raith150 Electron Beam Lithography System
Silicon Tube Furnaces
Reactive Ion Etching Machine (RIE), Oxford Plasmalab
Edwards Auto500 DC/RF Magnetron Sputtering System
Karl Suss MA-6 UV / DUV Mask Aligner
Surface Profilometer DEKTAK 150
Atomic Force Microscope Digital Instruments Dimension 3100
Optical Microscope Olympus BX30
Interference Lithography
Micromill CNC Mini- Mill/GX
Semiconductor Device Characterisation HP 4155A Parameter Analyser
Kulicke and Soffa Ultrasonic Wirebonder Model 4526
Cascade Microtech 11000 Probe Station with Temptronic TP03000 thermal chuck
EVG Automated NIL System
Heidelberg uPG101 Laser Mask Writer
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LEO FEG-SEM & Raith150 Electron Beam Lithography System
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Kulicke and Soffa Ultrasonic Wirebonder Model 4526
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Reactive Ion Etching Machine (RIE), Oxford Plasmalab/
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Yellow Room Materials Processing/Karl Suss MA-6 (UV/DUV) Mask Aligner
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Atomic Force Microscope Digital Instruments Dimension 3100
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Surface Profilometer DEKTAK 150
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Micromill CNC Mini- Mill/GX
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